# SPIE Photomask Technology + EUV Lithography

**Dates:** 2026-09-08 – 2026-09-11
**Duration:** 4 days
**Location:** Monterey, United States
**Website:** https://spie.org/conferences-and-exhibitions/photomask-technology-and-extreme-ultraviolet-lithography
**Organizer:** [SPIE](https://tradefest.io/en/search?organizer=spie)
**Size:** 50 exhibitors, 500 attendees

## Description

Attend SPIE Photomask Technology + Extreme Ultraviolet Lithography 2019 in Monterey, California. 

Come to this key technical meeting for mask makers, EUVL, emerging technologies, and the future of mask business. New in 2019, SPIE Photomask Technology and the International Conference on Extreme Ultraviolet Lithography are now co-located.

## About

Leading global trade fair and conference for photomasks, EUV lithography, and related processes.

## Topics

- Nanotechnology
- Research

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